Comparison of microwave ECR and RF plasmas for dry etching of single crystal 6H-SiC

J. R. Flemish; K. Xie; W. Buchwald; L. Casas; J. H. Zhao; G. McLane; M. Dubey

doi:10.1557/proc-339-145

Comparison of microwave ECR and RF plasmas for dry etching of single crystal 6H-SiC

J. R. Flemish
, K. Xie
, W. Buchwald
, L. Casas
, J. H. Zhao
, G. McLane
, M. Dubey

Engineering

U. S. Army Electronics Technology and Devices Laboratory

Research output: Contribution to journal › Conference article › peer-review

Original language	English
Pages (from-to)	145-150
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	339
DOIs	https://doi.org/10.1557/proc-339-145
State	Published - 1994
Event	Proceedings of the 1994 MRS Spring Meeting - San Francisco, CA, USA Duration: Apr 4 1994 → Apr 8 1994

ASJC Scopus Subject Areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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Cite this

@article{ee48faf86ae94fa8b4b6b52213162925,

title = "Comparison of microwave ECR and RF plasmas for dry etching of single crystal 6H-SiC",

author = "Flemish, \{J. R.\} and K. Xie and W. Buchwald and L. Casas and Zhao, \{J. H.\} and G. McLane and M. Dubey",

year = "1994",

doi = "10.1557/proc-339-145",

language = "English",

volume = "339",

pages = "145--150",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Proceedings of the 1994 MRS Spring Meeting ; Conference date: 04-04-1994 Through 08-04-1994",

}

TY - JOUR

T1 - Comparison of microwave ECR and RF plasmas for dry etching of single crystal 6H-SiC

AU - Flemish, J. R.

AU - Xie, K.

AU - Buchwald, W.

AU - Casas, L.

AU - Zhao, J. H.

AU - McLane, G.

AU - Dubey, M.

PY - 1994

Y1 - 1994

UR - https://www.scopus.com/pages/publications/0028754371

UR - https://www.scopus.com/pages/publications/0028754371#tab=citedBy

U2 - 10.1557/proc-339-145

DO - 10.1557/proc-339-145

M3 - Conference article

AN - SCOPUS:0028754371

SN - 0272-9172

VL - 339

SP - 145

EP - 150

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the 1994 MRS Spring Meeting

Y2 - 4 April 1994 through 8 April 1994

ER -

Comparison of microwave ECR and RF plasmas for dry etching of single crystal 6H-SiC

ASJC Scopus Subject Areas

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