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Electrically-detected magnetic resonance near the p-doped/n-doped interface of Si junction diodes

  • E. H. Poindexter
  • , F. C. Rong
  • , W. R. Buchwald
  • , G. J. Gerardi
  • , D. J. Keeble
  • , W. L. Warren
  • U. S. Army Electronics Technology and Devices Laboratory
  • William Paterson University
  • Michigan Technological University
  • Sandia National Laboratories, New Mexico

Research output: Contribution to journalArticlepeer-review

Abstract

Hyperfine structure has been observed in the electrically-detected magnetic resonance signal from a silicon p-n junction diode. By comparing the g value, hyperfine parameters, and bandgap energy level with known species having suitable abundances of isotopes with I = 1 2, the center is tentatively assigned as a platinum moiety, of presently undetermined structure. The observation indicates the usefulness of EDMR in the study of defects in ultrasmall Si devices, and raises certain questions regarding the current theories of spin-dependent recombination.

Original languageEnglish
Pages (from-to)119-125
Number of pages7
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume72
Issue numberC
DOIs
StatePublished - Jun 17 1993

ASJC Scopus Subject Areas

  • Surfaces and Interfaces
  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Keywords

  • Electrically-detected magnetic resonance
  • silicon junction diodes.

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