Skip to main navigation Skip to search Skip to main content

Extended infrared absorption to 2.2 μm with Ge1-xSnx photodetectors grown on silicon

  • Benjamin R. Conley
  • , Liang Huang
  • , Sayed Amir Ghetmiri
  • , Aboozar Mosleh
  • , Wei Du
  • , Greg Sun
  • , Richard Soref
  • , John Tolle
  • , Hameed A. Naseem
  • , Shui Qing Yu
  • University of Arkansas System
  • University of Massachusetts Boston
  • ASM

Research output: Contribution to conferencePaperpeer-review

Abstract

Thin film Ge1-xSnx photodetectors fabricated on Si using a CMOS compatible process had responsivities at 1.55 μm of 6.59, 1.49, 2.63, and 0.84 mA/W for 0.9, 2.57, 3.2, and 7.0 % Sn. Spectral response for a Ge0.93Sn0.07 photodetector had extended infrared response out to 2.2 μm.

Original languageEnglish
StatePublished - 2014
Event2014 Conference on Lasers and Electro-Optics, CLEO 2014 - San Jose, United States
Duration: Jun 8 2014Jun 13 2014

Conference

Conference2014 Conference on Lasers and Electro-Optics, CLEO 2014
Country/TerritoryUnited States
CitySan Jose
Period6/8/146/13/14

ASJC Scopus Subject Areas

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials

Fingerprint

Dive into the research topics of 'Extended infrared absorption to 2.2 μm with Ge1-xSnx photodetectors grown on silicon'. Together they form a unique fingerprint.

Cite this