Rf plasma oxidation of Ni thin films sputter deposited to generate thin nickel oxide layers

Megan L. Hoey; J. B. Carlson; R. M. Osgood; B. Kimball; W. Buchwald

doi:10.1063/1.3499661

Rf plasma oxidation of Ni thin films sputter deposited to generate thin nickel oxide layers

Megan L. Hoey
, J. B. Carlson
, R. M. Osgood
, B. Kimball
, W. Buchwald

Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English
Article number	153104
Journal	Applied Physics Letters
Volume	97
Issue number	15
DOIs	https://doi.org/10.1063/1.3499661
State	Published - Oct 11 2010

ASJC Scopus Subject Areas

Physics and Astronomy (miscellaneous)

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title = "Rf plasma oxidation of Ni thin films sputter deposited to generate thin nickel oxide layers",

author = "Hoey, \{Megan L.\} and Carlson, \{J. B.\} and Osgood, \{R. M.\} and B. Kimball and W. Buchwald",

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doi = "10.1063/1.3499661",

language = "English",

volume = "97",

journal = "Applied Physics Letters",

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publisher = "American Institute of Physics",

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T1 - Rf plasma oxidation of Ni thin films sputter deposited to generate thin nickel oxide layers

AU - Hoey, Megan L.

AU - Carlson, J. B.

AU - Osgood, R. M.

AU - Kimball, B.

AU - Buchwald, W.

PY - 2010/10/11

Y1 - 2010/10/11

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UR - https://www.scopus.com/pages/publications/77958095438#tab=citedBy

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DO - 10.1063/1.3499661

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VL - 97

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 15

M1 - 153104

ER -

Rf plasma oxidation of Ni thin films sputter deposited to generate thin nickel oxide layers

ASJC Scopus Subject Areas

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