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Si based GeSn light emitter: Mid-infrared devices in Si photonics

  • S. Q. Yu
  • , S. A. Ghetmiri
  • , W. Du
  • , J. Margetis
  • , Y. Zhou
  • , A. Mosleh
  • , S. Al-Kabi
  • , A. Nazzal
  • , G. Sun
  • , R. A. Soref
  • , J. Tolle
  • , B. Li
  • , H. A. Naseem
  • University of Arkansas System
  • ASM
  • Wilkes University
  • University of Massachusetts Boston
  • Arktonics, LLC

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Ge1-xSnx/Ge thin films and Ge/Ge1-xSnx/Ge n-i-p double heterostructure (DHS) have been grown using commercially available reduced pressure chemical vapor deposition (RPCVD) reactor. The Sn compositional material and optical characteristics have been investigated. A direct bandgap GeSn material has been identified with Sn composition of 10%. The GeSn DHS samples were fabricated into LED devices. Room temperature electroluminescence spectra were studied. A maximum emission power of 28mW was obtained with 10% Sn LED under the injection current density of 800 A/cm2.

Original languageEnglish
Title of host publicationSilicon Photonics X
EditorsGraham T. Reed, Michael R. Watts
PublisherSPIE
ISBN (Electronic)9781628414578
DOIs
StatePublished - 2015
EventSilicon Photonics X - San Francisco, United States
Duration: Feb 9 2015Feb 12 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9367
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceSilicon Photonics X
Country/TerritoryUnited States
CitySan Francisco
Period2/9/152/12/15

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Keywords

  • GeSn bandgap
  • Infrared
  • light emitting diodes

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