Sidewall profile control of thick benzocyclobutene reactively ion etched in CF4 O2 plasmas

Walter R. Buchwald; Kenneth Vaccaro

doi:10.1116/1.1835313

Sidewall profile control of thick benzocyclobutene reactively ion etched in CF4 O2 plasmas

Walter R. Buchwald
, Kenneth Vaccaro

Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	51-56
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	23
Issue number	1
DOIs	https://doi.org/10.1116/1.1835313
State	Published - 2005

ASJC Scopus Subject Areas

Condensed Matter Physics
Electrical and Electronic Engineering

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title = "Sidewall profile control of thick benzocyclobutene reactively ion etched in CF4 O2 plasmas",

author = "Buchwald, \{Walter R.\} and Kenneth Vaccaro",

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AU - Buchwald, Walter R.

AU - Vaccaro, Kenneth

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Sidewall profile control of thick benzocyclobutene reactively ion etched in CF4 O2 plasmas

ASJC Scopus Subject Areas

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