The characteristic of strain relaxation on SiGe virtual substrate with thermal annealing

Wu Ping Huang; Henry H. Cheng; Greg Sun; Re Fa Lou; J. H. Yeh; Tzer Min Shen

doi:10.1063/1.2794016

The characteristic of strain relaxation on SiGe virtual substrate with thermal annealing

Wu Ping Huang
, Henry H. Cheng
, Greg Sun
, Re Fa Lou
, J. H. Yeh
, Tzer Min Shen

Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English
Article number	142102
Journal	Applied Physics Letters
Volume	91
Issue number	14
DOIs	https://doi.org/10.1063/1.2794016
State	Published - 2007

ASJC Scopus Subject Areas

Physics and Astronomy (miscellaneous)

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10.1063/1.2794016

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@article{342de7adf5e244e684a01deb5ff5920b,

title = "The characteristic of strain relaxation on SiGe virtual substrate with thermal annealing",

author = "Huang, \{Wu Ping\} and Cheng, \{Henry H.\} and Greg Sun and Lou, \{Re Fa\} and Yeh, \{J. H.\} and Shen, \{Tzer Min\}",

year = "2007",

doi = "10.1063/1.2794016",

language = "English",

volume = "91",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "14",

}

TY - JOUR

T1 - The characteristic of strain relaxation on SiGe virtual substrate with thermal annealing

AU - Huang, Wu Ping

AU - Cheng, Henry H.

AU - Sun, Greg

AU - Lou, Re Fa

AU - Yeh, J. H.

AU - Shen, Tzer Min

PY - 2007

Y1 - 2007

UR - https://www.scopus.com/pages/publications/34948845213

UR - https://www.scopus.com/pages/publications/34948845213#tab=citedBy

U2 - 10.1063/1.2794016

DO - 10.1063/1.2794016

M3 - Article

AN - SCOPUS:34948845213

SN - 0003-6951

VL - 91

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 14

M1 - 142102

ER -

The characteristic of strain relaxation on SiGe virtual substrate with thermal annealing

ASJC Scopus Subject Areas

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